Controlling structure and morphology

Ahmed, Waqar orcid iconORCID: 0000-0003-4152-5172, Jackson, Mark J., Sein, Htet, Rego, Cristopher A., Elhissi, Adbelbary, Phoenix, David Andrew and Crean, Stjohn orcid iconORCID: 0000-0001-9336-8549 (2014) Controlling structure and morphology. In: Chemical Vapour Deposition of Diamond for Dental Tools and Burs. SpringerBriefs in Materials . Springer, pp. 109-121. ISBN 978-3-319-00647-5

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The performace of the burs and tools coated with diamond depend on the properties of the films deposited including the structure, morphology and adhesion onto the substrated material. These film characteristics are in turn controlled by a number of factors incluing the VFCD reactor parameters such as substrate temperature, substrate bias, pressure, methanes concentration, plasma characteristics and affinity of the substrate for diamon nucleation. In this chapter we examine the effects of process parameters on the structure and morphology of the films depositied and therefore control of the films properties.

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